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ASM AMERICA, INC. v. GENUS, INC.

No. 04-1211.

401 F.3d 1340 (2005)

ASM AMERICA, INC., Plaintiff/Counterclaim Defendant-Appellant, and Arthur Sherman, Plaintiff, and ASM International, N.V., Counterclaim Defendant, v. GENUS, INC., Defendant/Counterclaimant-Appellee.

United States Court of Appeals, Federal Circuit.

March 16, 2005.

Attorney(s) appearing for the Case

Henry C. Bunsow, Howrey Simon Arnold & White, LLP, of San Francisco, California, argued for plaintiff/counterclaim defendant-appellant. With him on the brief was Matthew C. Rainey.

Edward R. Reines, Weil, Gotshal & Manges LLP, of Redwood Shores, California, argued for defendant/counterclaimant-appellee.

Before NEWMAN, Circuit Judge, FRIEDMAN, Senior Circuit Judge, and BRYSON, Circuit Judge.

BRYSON, Circuit Judge.

This case involves a process known as sequential Atomic Layer Deposition ("ALD"), which is used to deposit extremely thin layers of different materials on the surface of a substrate, often as part of the process of manufacturing semiconductor devices. The materials, or reactants, are applied to the substrate by sequentially vaporizing each reactant and passing it over the substrate. Each reactant must be removed from the area of the substrate...

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