ADE CORP. v. KLA-TENCOR CORP.

No. CIV.A. 00-892 MPT.

220 F.Supp.2d 303 (2002)

ADE CORPORATION, Plaintiff, v. KLA-TENCOR CORPORATION, Defendant.

United States District Court, D. Delaware.

September 9, 2002.


Attorney(s) appearing for the Case

William J. Marsden, Jr., Esquire, Thomas L. Halkowski, Esquire, Fish & Richardson P.C., Wilmington, Delaware, attorneys for the plaintiff ADE Corporation. Of Counsel: Robert E. Hillman, Esquire, Craig R. Smith, Esquire, Fish & Richardson P.C., Boston, MA; Howard G. Pollack, Esquire, Kimberly A. Donovan, Esquire, Fish & Richardson P.C., Redwood City, CA.

Rudolf E. Hutz, Esquire, Patricia Smink Rogowski, Esquire, Connolly Bove Lodge & Hutz LLP, Wilmington, Delaware, attorneys for the defendant/counterclaimant KLA-Tencor Corporation. Of Counsel: Michael H. Kalkstein, Esquire, Chris Scott Graham, Esquire, David C. Bohrer, Esquire, Shawn A. Mangano, Esquire, Oppenheimer Wolff & Donnelly LLP, Palo Alto, CA.


AMENDED MEMORANDUM OPINION

THYNGE, United States Magistrate Judge.

Plaintiff, ADE Corporation ("ADE"), and defendant, KLA-Tencor Corporation ("KLA"), are owners of patents directed to the detection and classification of defects on the surface of silicon wafers as crystalline originated pit ("COP") defects or particle defects. On October 10, 2000, ADE filed this patent infringement suit against KLA alleging infringement of its 6,118,525 patent. D.I. 1. KLA...

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